In recent years, the development of high-power laser, deep ultraviolet/X-ray and other fields not only expands the choice of optical materials, but also puts forward the processing requirements of extremely precise surface and ultra-smooth surface for optical components. Therefore, it is very important to seek a breakthrough in new coating technology and realize dense and accurate film layer. At the same time, the quantitative measurement of absorption rate and laser damage threshold, the surface roughness is sub-nanometer, in addition, the coating technology with laser damage threshold exceeding 40J/cm2 and the high output components with absorption rate less than 0.15 are effective for improving the reliability of the laser above the kilowatt level. It is important and urgent to develop test instruments that are in line with international measurement standards. Then, let's learn about high-power laser optical components and measurement technology!

　　Processing of high power laser optical components

　　01, Selection of Optical Materials

For ultraviolet, YAG fiber, semiconductor lasers, etc., quartz glass has a low thermal expansion coefficient, less impurity content, and good optical uniformity compared with K9 glass, so it is welcomed by the high-power laser market. In the field of high-power and ultra-high-speed laser applications, commonly used optical component materials are H-K9L, ultraviolet fused silica (JGS1), Heraeus 313 and Corning 7980. Domestic manufacturers tend to foreign Heraeus and Corning materials.

　　02, Sub-nanometer Polishing Technology

For ultra-smooth surfaces, in addition to the high requirements for surface accuracy and surface roughness, the key is the last process. It is ultra-precision grinding technology. The ultra-smooth surface processing technology of wavelength photoelectric combines the traditional mechanical removal method and magnetic grinding method, and also requires that the surface has no complete lattice structure and defects, and can remove the processing damage layer. The surface roughness reaches less than 5.

　　03, Ion Plating Technology

The preparation of laser thin film is usually prepared by electron gun evaporation or ion beam assisted electron gun evaporation, which limits the improvement of the laser damage threshold of the film. On the other hand, the ion beam reactive sputtering film forming technology is formed at a temperature close to room temperature, but the film is prone to nodule defects and high temperature film formation to produce microscopic grains, it is difficult to prepare high-quality laser film, can obtain amorphous state microstructure of the film, in addition, can suppress the optical absorption to a minimum.

We use ion beam reactive sputtering deposition instrument to prepare the laser reflection of hafnium oxide and silicon dioxide, and has very low scattering and absorption, uniform amorphous structure, less impurity defects, high laser damage value. The laser damage threshold was 40J/cm2, and the optical properties, structural characteristics and laser damage performance of the film were studied. The results show that the laser thin film deposited by sputtering is not only dense, but also the detection condition of optical elements: the energy density when the damage probability is 0 is used as the damage threshold of the sample. At present, the detection laser wavelength is 1 064 nm, the pulse width is 10 ns, and the sample detection is carried out in a 1-in -1 manner. It is a problem to improve the purity of the film-forming material.

　　Damage Threshold Test of Optical Lens

Optical film laser damage threshold tester is based on the international standard ISO11254, mainly used for film or optical component surface strong anti-laser ability test, the device can be optical components or film laser damage threshold and damage spot test; laser pretreatment, improve the film laser damage threshold.

The instrument is easy to use, and the extended function modules include discussion module, spectrum analysis and discrimination module, acoustic spectrum analysis and discrimination module, mass spectrometry analysis and discrimination module, which is convenient to test and realizes digitization, integration and intelligence. The basic functional modules include a scattering discrimination module and an image discrimination module.

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